In microfluidics applications, SU-8 has proved to be a highly enduring and effective mold material. However, SU-8 has not seen a large use in actuated, high aspect ratio, 3D devices due to the difficulty in manufacturing multi-layer, freestanding structures. The goal of this research is to use two simple photolithographic techniques involving both negative and positive photoresists as both sacrificial layers and structural layers to create multi-layer, freestanding SU-8 structures. The first method utilizes AZ P4330-RS, a positive photoresist, along with UV exposure and chemical development to create a sacrificial scaffold structure. A negative photoresist (SU-8) is then applied over the AZ P4330-RS scaffold as a structural layer. The scaffold layer is then removed leaving a freestanding SU-8 structure. The second method utilizes a Sudan III dye-doped version of SU-8 as a scaffold structure. With the dye-doping, the modified SU-8 will have a much lower transmittance for UV light and thus must be exposed to a much higher dose of UV light to polymerize and become a permanent structure. This increased requirement for UV light can thus make the modified SU-8 both a scaffold material that can be placed under unmodified SU-8 as well as a UV blocking layer that can be placed over top of unmodified SU-8 and protect it from UV exposure based polymerization.